We are happy to announce the publication of the proceedings for the 2023 Source Workshop held in Aachen, Germany from October 21-25, 2023. This year, we experienced our largest turnout and are looking forward to next year’s workshop to be held at ARCNL. We thank all who were involved in contributing to this year’s great success.
Proceedings are now published!
First Place
“Mitigation of Polarization-Dependent Uncertainties in a Compact EUV Spectrometer”
Sophia Schröder- RWTH Aachen University
Second Place
“Vaporization Dynamics of Liquid Tin Sheet Targets”
Karl Schubert- ARCNL
Special Mention
“TEUS: High-Brightness EUV LPP Light Source Based on Fast Rotating Target. Product Overview and Specifications”
Alexander Toustopyat- ISTEQ
The 2022 Source Workshop was a successful gathering of the EUVL community.
PROCEEDINGS NOW PUBLISHED!
Co-organized by EUV Litho, Inc., ARCNL, and EUV-IUCC, the annual Source Workshop focuses on the latest scientific and technical developments related to extreme ultraviolet (EUV) and soft X-ray sources and provides a forum for researchers and end-users in this area to present their work and discuss a wide range of potential applications.
- “Development Progress of The Key Component Technologies for a Laser Produced Plasma EUV Light Source” (S81) – Yuichi Nishimura, Gigaphoton
- “Investigation of Laser-Produced Plasmas During the Irradiation Using Collective Thomson Scattering” (S82) – Yiming Pan, Kyushu University (Third Place)
- “Seeing the Light: In-Band and Spectrally Resolved EUV Source Imaging” – Yahia Mostafa, ARCNL
- “In-Band and Out-Of-Band Images of Tin Laser Produced Plasma Source Using Coupled Imaging/Spectroscopy Device” – Zoi Bouza, ARCNL (Second Place)
- “Imaging LPP WW Sources: How Small is The SXR Emission Area of Micrometer Plasmas?” (S85) – Ruairi Brady, UCD (First Place)
- “Compact Rotating Sn Disc Target LPP Source” (S86) – Yusuke Teramoto, Ushio
