Patents, Papers, and Reports
EUV Lithography – 2nd Edition (Editor)
SPIE Press 2018
This book covers the fundamental aspects of extreme ultraviolet lithography (EUVL) of EUVL used in the field. Since 2008, when SPIE Press published the first edition of EUVL Lithography, much progress has been made to elevate EUVL as the top choice for next-generation lithography. This comprehensive volume is composed of contributions from the world’s leading EUVL researchers and provides the critical information needed by practitioners and those new to the field alike. This book is intended for both people who are involved within the field, as well as students.
EUV Lithography (Editor)
SPIE and John Wiley and Sons, 2009
Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists.
This comprehensive volume is comprised of contributions from the world’s leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field.
Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology.
EUV Sources for Lithography (Editor)
SPIE, 2006
Edited by a senior technical staff member at SEMATECH, this book serves as the authoritative reference book on EUV source technology. This volume contains 38 chapters contributed by leading researchers and suppliers, ranging from a variety of subjects from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources.
The book is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Extreme Ultraviolet Lithography (Editors: Vivek Bakshi and Anthony Yen)
SPIE, December 6, 2012
An SPIE Special Collection
Originally published in the Journal of Micro/Nanolithography, MEMS, and MOEMS and Proceedings of SPIE, this special collection of EUVL papers will ease the reader’s overwhelming task of sorting through volumes of technical papers to find informative and well-written work on specific topics of interest.
These selected papers were originally published in the Journal of Micro/Nanolithography, MEMS, and MOEMS and Proceedings of SPIE.