2017 EUVL Workshop – Final Agenda  announced!

Early Registration Deadline (with discounted rates): May 23, 2017

Post Deadline Poster Paper Abstract Submission Deadline: May 23, 2017

Berkeley Guest House Rooms for 2017 EUVL workshop will be released on June 2, 2017

We are happy to announce the final agenda and abstract book for the 2017 EUVL Workshop, which can be downloaded at the links below.  All presenters have been sent acceptance letters. Please contact us if you have not received your acceptance letter. We are now only accepting abstracts for post-deadline poster papers. The deadline for post-deadline poster paper abstract submission is May 23, 2017.

The 2017 EUVL Workshop (2017 International Workshop on EUV Lithography) will be held June 12-15 at The Center for X-ray Optics (CXRO) at Lawrence Berkeley National Laboratory in Berkeley, CA. This workshop, now in its tenth year, is focused on the fundamental science of EUV Lithography (EUVL). Call for papers with instruction for submission of abstracts, travel and hotel information, on-line registration is available at the links below.

The early registration deadline, which offers discounted rates, is May 23, 2017. Please write to info@euvlitho.com if you have any questions or need further information.