Final Agenda and Abstract Book Published
2026 EUVL and Source Workshop
Final Agenda
List of Accepted Papers
Abstract Book
The Deadline for Poster Presentation Abstract Submissions has been Extended until April 24, 2026
The 2026 EUVL and Source Workshop, organized by EUV Litho, Inc. and co-hosted by EUV Tech, Molecular Foundry, and the BETR Center at UC Berkeley, will unite the global community working on EUV lithography for the continued extension of Moore’s law. The workshop will address topics relevant to high-NA and hyper-NA lithography, including advanced source technology, materials, metrology, and the extension of lithography to wavelengths below 13.5 nm. The workshop will address current and future manufacturing challenges including k1 reduction, high-NA scanner infrastructure, and emergingtechnologies like hyper-NA, Blue-X lithography, and AI/ML applications to support semiconductor manufacturing through 2030 and beyond. A Supplier Showcase will complement technical presentations by bringing together suppliers, researchers, and end-users to discuss technologies, specifications, and challenges across the EUV and source communities.
Confirmed Keynote Speakers
Confirmed Invited Speakers (Blue-X Sessions and EUVL and Source Workshop): Please see the List of Accepted Papers for a complete list.
Abstract Submission Deadline for Poster Papers: Friday, April 24, 2026
For logistics questions, email info@euvlitho.com
Workshop Chair
Vivek Bakshi, EUV Litho, Inc. (vivek.bakshi@euvlitho.com)
Workshop Co-Chairs
Patrick Naulleau, EUV Tech (pnaulleau@euvtech.com)
Ricardo Ruiz, Molecular Foundry, LBL (ricardo.ruiz@lbl.gov)
Michael Bartl, UC Berkeley (mbartl@berkeley.edu)
Oscar Versolato, ARCNL (O.Versolato@arcnl.nl)
- For List of Topics, Agenda Outline and Sumission Instructions, please see First Call for Papers
- Poster Presentation Instructions
- Template for Abstract Submission
- EUV Lithogrpahy Short Course:
- EUV and Soft X-Ray Sources Short Course:
- EUVL and Source Workshop Registration and Sponsorship
- Please note that discounted early registration will be available until May 8.
- Venue, Travel, and Lodging
2025 EUVL and Source Workshop Proceedings Published
The 2025 EUVL and Source Workshop and Blue-X TWG meeting was successfully held from June 23-26,2025 at MIT LL. Online short courses were held from June 21-22, 2025. The workshop proceedings for the 2025 EUVL and Source Workshop are now available at the link below.
Nikon Research Corporation of America (NRCA) Joins Blue-X Consortium to Explore Leading-Edge Lithography at < 13. 5 nm
The Blue-X consortium has recently welcomed six new members, including Nikon Research Corporation of America (NRCA), expanding its collaborative network to explore advanced optical projection lithography at wavelengths below 13.5 nm. EUV Litho, Inc. organizes this consortium as a Technical Working Group (TWG), which now comprises over 65 members who collectively have assigned more than 170 professionals to various sub-TWGs.
Among the distinguished members are major chip manufacturers such as IBM and Intel, along with a mix of large and small original equipment manufacturers (OEMs), National Labs, and independent experts from around the globe. This diverse group aims to push the boundaries of advanced lithography beyond 13.5 nm by harnessing collective expertise and fostering innovation across several specialized sub-TWGs. These sub-groups tackle critical areas, including Imaging and Optical Design, Optics, Mask, Metrology, Resist and Patterning and various Photon Source technologies.
The consortium also is engaging in initiatives such as Resist Evaluations at beamlines, ML optics development, optical design evaluations and Source Evaluations through programs like Flying Circus. These efforts underscore the Blue-X consortium’s dedication to advancing research and technology in the field. Detailed program information will be released soon.
The annual in-person meeting of the Blue-X TWG is scheduled for June 23rd at MIT LL. This event is exclusive to Blue-X TWG members, with a registration deadline of May 23rd. This meeting presents a unique opportunity to engage with leading experts and explore the next wave of technological innovations beyond EUV. Interested parties are encouraged to contact info@euvlitho.com for program updates, white papers, and membership information. The detailed agenda for the meeting, along with information for the 2025 EUVL and Source Workshop, has been announced on www.euvlitho.com.