The 2022 Source Workshop was a successful gathering of the EUVL community.
PROCEEDINGS NOW PUBLISHED!
Click Here to Download
Co-organized by EUV Litho, Inc., ARCNL, and EUV-IUCC, the annual Source Workshop focuses on the latest scientific and technical developments related to extreme ultraviolet (EUV) and soft X-ray sources and provides a forum for researchers and end-users in this area to present their work and discuss a wide range of potential applications.
- “Development Progress of The Key Component Technologies for a Laser Produced Plasma EUV Light Source” (S81) – Yuichi Nishimura, Gigaphoton
- “Investigation of Laser-Produced Plasmas During the Irradiation Using Collective Thomson Scattering” (S82) – Yiming Pan, Kyushu University (Third Place)
- “Seeing the Light: In-Band and Spectrally Resolved EUV Source Imaging” – Yahia Mostafa, ARCNL
- “In-Band and Out-Of-Band Images of Tin Laser Produced Plasma Source Using Coupled Imaging/Spectroscopy Device” – Zoi Bouza, ARCNL (Second Place)
- “Imaging LPP WW Sources: How Small is The SXR Emission Area of Micrometer Plasmas?” (S85) – Ruairi Brady, UCD (First Place)
- “Compact Rotating Sn Disc Target LPP Source” (S86) – Yusuke Teramoto, Ushio
