Archives: EUVL Workshops

2017 EUVL Workshop Proceedings

2017 EUVL Workshop Agenda

2017 EUVL Workshop Abstracts

2017 EUVL Workshop Photographs

 

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• 2015 EUVL Workshop Proceedings
  
• 2015 EUVL Workshop Abstracts
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• 2015 EUVL Workshop Agenda

 

• Workshop Proceedings
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• List of Technical Challenges

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2013 International Workshop on EUV Lithography Sponsors:

• Workshop Proceedings
• Award Ceremony
• Workshop Photographs
• Workshop Agenda
• Workshop Abstracts

Makena Beach Golf Resort
June 13-17, 2011, Maui, Hawaii, USA

2011 EUVL Workshop was successfully held from June 13-17, 2011. The workshop proceedings are now available for download:

• Workshop Proceedings
• Workshop Summary
• Workshop Agenda
• Workshop Abstracts
• Workshop Photographs

Makena Beach Golf Resort
June 21-25, 2010, Maui, Hawaii, USA

2010 EUVL Workshop was successfully held from June 21-25, 2010. The workshop proceedings are now available for download:

• Workshop Proceedings
• Workshop Agenda
• Workshop Abstract Book
• Keynote Talk (Benschop-ASML)
• Keynote Talk (Wood-GLOBALFOUNDRIES)
• Keynote Talk (Nishiyama-SELETE)
• Press Release
• Award Ceremony
• Workshop Photos

The workshop was successfully held from July 13-17, 2009 at Sheraton Waikiki, Honolulu, Oahu, Hawaii, USA. The  proceedings of this workshop are available at no cost for download  at:

• Workshop Proceedings – 2009 International Workshop on EUV Lithography
• Agenda: 2009 International Workshop on EUV Lithography
• Abstracts: 2009 International Workshop on EUV Lithography
• 2009 EUVL Workshop Award Ceremony

An article with highlights from the 2009 EUVL workshop is available at:

• Semiconductor International

Other perspectives on the EUVL Workshop can be found at:

• Tropical Topical Lithography: Litho Guru Perspective
• Top-10-Facts Gleaned at EUV Lithography Workshop
• Fiber Lasers for Extreme Photons

Successful EUVL R&D Forum

The 2008 International Workshop on EUV Lithography was held June 10-12, 2008 at the Wailea Beach Marriott in Maui, Hawaii. The EUVL Workshop successfully achieved its goal of being a R&D forum for EUVL to help address technical challenges to bring EUVL into high-volume semiconductor manufacturing. Researchers from North American, Europe and Asia attended the workshop and presented their research in the area of EUV sources, mask, optics, contamination and resists. Panel discussions were held in the area of EUV sources, mask defects and the role of universities and national labs in the EUVL R&D. Also included in the workshop were technical review papers and the workshop was preceded by EUVL education classes.

The workshop agenda, abstracts of papers and proceedings are available via weblinks below.

For more highlights on the 2008 International Workshop, download the press release here.

2008 EUVL Workshop Proceedings

Proceedings available here.

2008 Workshop Agenda and Abstracts

The Workshop Agenda and abstracts of the papers can be obtained at the following link:

Download the Agenda and Abstracts in PDF Format

Download the Agenda in PDF Format