Patents
EUV Lithography Filter, US Patent #7250620 (July 31, 2007)
Systems and Methods for In-Situ Reflectivity Degradation Monitoring of Optical Collectors Used in Extreme Ultraviolet (EUV) Lithography Processes, US Patent #7760341 (July 20, 2010)
Systems and Methods for Monitoring and Controlling the Operation of Extreme Ultraviolet (EUV) Light Sources Used in Semiconductor Fabrication, US Patent #7709816 (May 4, 2010)
Selected Papers and Reports
Cross-Calibration of Absolute Spectral Measurements and PhysTex Energy Monitor for the In-Band and Out-of-Band Region on a Tin (Sn) LPP Source , Technology Transfer #06114813A-ENG, with Padraig Dunne, Oran Morris, Emma Sokell, Gerry O’Sullivan, Fergal O’Reilly, Nicola Murphy, and Patrick Hayden (University College Dublin), November 30, 2006.
Cross-Calibration of Extreme Ultraviolet (EUV) Energy Sensors, Technology Transfer #04024498A-TR, Santi Alonso van der Westen, René de Bruijn, Dr. Fred Bijkerk, Vivek Bakshi, Max Schuermann, Thomas Missalla, Dr. Uwe Stamm, Guido Schriever, Kai Gabel, and Guido Hergenhan, April 2, 2004.
Calibration of an Extreme Ultraviolet (EUV) Source at PLEX LLC, Technology Transfer #04024490A-TR. Santi Alonso van der Westen, Fred Bijkerk, Vivek Bakshi, April 2, 2004.
Study of Effect of Plasma Etching on Line Edge Roughness (LER), Session F2- “Thin Film Materials, Process and Reliability: Plasma Processing for the 100 nm Node and Copper Interconnects with Low-k Inter Level Dielectric Films.” ECS 203rd Meeting, April 27-May 2, 2003, Paris, France.
Patterning 180 nm Copper-Oxide Dual Damascene Baseline with 193nm Resists, International Symposium on Plasma Processing XIV, as a part of the 201st Meeting of The Electrochemical Society in Philadelphia, PA, May 12-17, 2002.
Benchmarking 193 nm Resist Etch Resistance, 10th International Symposium on Semiconductor Manufacturing, October 8-10, 2001, San Jose, CA, USA. Paper published in 2001 IEEE International Symposium on Semiconductor Manufacturing, pp. 215-218, 2001.
Current Performance of 193 nm Resists. Are They Ready for Production?, Interface 2001 Conference, November 11-13, 2001, San Diego, CA, USA.
A Comparison of Spectroscopic Measurements of an Inductive Plasma Source with the INDUCT Mode, American Vacuum Society 46 th International Symposium, Paper MS-MoM5, with Huebschman et al, October 24, 1999, Seattle, Washington, USA.
Benchmarking of Commercial Software for Fault Detection and Classification (FDC) of Plasma Etchers for Semiconductor Manufacturing Equipment, 1997 American Control Conference, June 6, 1997, Albuquerque, New Mexico.
Evaluation of Brookside Fault Detection and Classification (FDC) Software on Applied Materials 5000 and 5300 Etch Tools, 191st Meeting of Electrochemical Society, Andrea Musat and Doug Roberts, May 25, Montreal, Canada, Paper published in Electrochemical Society Proceedings, Volume 97-9, pp. 64-71, 1997.
SEMATECH Projects in Advanced Process Control, Sixth International Symposium on Semiconductor Manufacturing, with Hal Bogardus and John Gragg, October 6-8, 1997, San Francisco, CA.
Measurement of Temperature in Optically Thick Railgun Plasma Armatures, IEEE Transactions on Magnetics 31, No. 1, pp. 673, January 1995.1994
Study of Forces in Thunderbolt Railgun, 24th AIAA Conference on Plasmadynamics, July 6-9, 1993, Orlando, Florida.
Electron-impact width of Si III Transitions, AIP Conf. Proceedings, Dec 1 1990, Vol. 216, pp. 71-72, doi:10.1063/1.39876, Issue Date: 1 December 1990
Saha Equation for a Two Temperature Plasma, Physical Review A 42, No. 4, 2461, 15 August 90.
New Tables for Voigt Function, with R. J. Kearney, Journal of Quantitative Spectroscopy and Radiative Transfer 42, Number 2, 111116, August 1989.
Investigation of Local Thermodynamic Equilibrium (LTE) in an Argon DC Plasma Jet at Atmospheric Pressure, with R. J. Kearney, Journal of Quantitative Spectroscopy and Radiative Transfer 41, Number 5, 369376, February 1989.
Temperature Fluctuations in an Atmospheric Pressure DC Plasma, with J. Grandy, R. J. Kearney and Jim Batdorf, Journal of Quantitative Spectroscopy and Radiative Transfer 41, Number 2, 147152, February 1989.
Effect of Power Variation on Thermal Plasma Optical Diagnostics Data, with R. J. Kearney, Journal of Quantitative Spectroscopy and Radiative Transfer 41, Number 2, 9396, February 1989.