Blogs

• EUV Physics and EUVL Short Courses at 2023 EUVL Workshop and Supplier Showcase (June 3 and 4, 2023)
• 2023 EUVL Workshop and Supplier Showcase Agenda Highlights
• 2022 Source Workshop Agenda Highlights Vlog
• Vivek Bakshi is a guest on the Merck Podcast: Future Talk -EPISODE 31 – Small Question, Big Answer
• 2022 EUVL Workshop & Supplier Showcase Agenda Highlights
• 2022 EUVL Workshop & Supplier Showcase Agenda Highlights Video Blog
• 2022 Supplier Showcase Blog
• 2021 Source Workshop Poster / Speed Presentation Session Award Winners
• 2021 Source Workshop – Agenda Highlights
• 2021 EUVL Supplier Showcase – Blog on Showcase Highlights (September 12, 2021)
• 2021 EUVL Workshop- Blog on Agenda Highlights, IMEC Program Showcase and New Short Courses in Advanced Nanoscale Imaging and EUVL (May 31, 2021)
• The Chip Choke Point (interview with Tim De Chant, published in The Wire China) (February 7, 2020)
• 2020 Source Workshop Agenda Highlights (October 21, 2020)
• Improving EUV Sources for EUVL – How Code Comparison for Plasma Modeling of Sn LPP Plasmas can help (August 17, 2020)
• Introducing the EUVL Supplier Showcase: an Amazing Way to Learn Directly from Suppliers about the Newest and Best Products and Services for the EUVL Infrastructure (July 27, 2020)
• Learn about the latest challenges of EUVL and how we will address them in the EUVL Workshop next week – Introducing agenda for 2020 EUVL Workshop (June 1, 2020)
• New Era of education Arrives in Wake of COVID-19 – EUVL Short Course Now Offered Online 
• Organizing EUVL Conferences in the Era of COVID-19 – Introducing 2020 EUVL Workshop (May 15, 2020)
• 2019 Source Workshop – Highlights (December 15, 2019)
• Touring the Factory in Holland that is Driving Moore’s Law (December 2, 2019)
• Latest news on EUVL: Highlights from 2019 EUVL Workshop (July 23, 2019)
• Don’t Miss “Showcase of Proven Leadership in EUVL Infrastructure Development” by CXRO, during 2019 EUVL Workshop (May 27, 2019) 
• EUV Lithography Explained – EUVL short course during 2019 EUVL Workshop (May 20, 2019)
• Frontiers of EUVL Technology Challenges – Focusing on EUVL Infrastructure in the 2019 EUVL workshop (May 12, 2019)
• 2019 SPIE Advanced Lithography Conference Review Part II: Further Thoughts (April 19, 2019)
• 2019 SPIE Advanced Lithography EUVL Conference Review Part I: Data (April 19, 2019)
• Current Challenges and New Frontiers for EUV Sources: Update from 2018 Source Workshop (February 7, 2019)
• Understanding EUV Lithography : Technology that enables extension of Moore’s Law (SPIE newsroom, July 2018)
• 2018 EUVL Workshop Summary (July 2018)
• Black Swans Unmasked and Other Stories from my Days in San Jose— Further Thoughts on 2018 SPIE AL EUVL Conference (March 22, 2018)
• Outlook for EUVL (February 9, 2018)
• Latest on EUV Source Technology: Highlights from 2017 Source Workshop (February 5, 2018)
• New Frontiers for EUVL— Sources and Metrology: Topics for 2017 Source Workshop (October 15, 2017)
• Understanding EUV Lithography Basics and Status: Key Concepts (May 23, 2017)
• Further Thoughts from the 2017 SPIE AL EUV Lithography Conference (March 17, 2017)
• Bringing you Holiday Cheer, Courtesy of Moore’s Law! (December 19, 2016)
• Highlights from 2016 Source Workshop (December 19, 2016)
• Pushing Frontiers of EUV Source Technology— 2016 Source Workshop (October 20, 2016)
• 2015 SPIE Advanced Lithography EUVL Conference – Summary and Analysis (March 9, 2015)
• The Bet on EUVL (interview with Chris Mack) (February 21, 2015)
• EUVL – remaining challenges and preview of topics for the 2015 SPIE EUVL Conference (February 3, 2015)
• Thoughts on the Significance of IBM’s EUV Benchmark (August 4, 2014)
• Insertion of EUVL into fab: Challenges for 7 nm insertion (May 12, 2014)
• State of EUVL – Challenges of HVM Introduction (March 4, 2014
• Is the Chip Industry as Important as We Think? Depends on Whom You Ask (February 5, 2014)
• Still a Tale of Two Paths: Highlights of Lithography Panel from SEMICON West 2013 (July 12, 2013)
• Critical challenges of EUVL (March 8, 2013)
• EUV Source Roadmaps— Physics vs Engineering (January 28, 2013)
• Moving Forward with Moore’s Law: Throughput of EUV Scanners (September 29, 2012)
• SPIE— JM3 Journal publishes special issue on EUV sources (May 29, 2012)
• SPIE 2012: Spring of EUVL (March 20, 2012)
• USHIO gains market share in EUV Source Business (December 17, 2010)
• Lotus Dreams: EUVL Continues to Approach Readiness (March 20, 2010)
• Picking the Winning NGL Technology (February 13, 2010)
• Race to EUV Still Depends on Photons (December 2, 2009)
• EUV Sources come back as Top EUV Lithography Concern (July 21, 2009)
• It’s EUV Source— again! (July 17, 2009)
• I believe in EUVL, I do, I do! (interview with Sally Adee, published in IEEE Spectrum) (July 13, 2009)
• Plenty of Reasons to be Confident about EUV Lithography (March 11, 2009)
• Looking for Lake Tahoe: A Metaphor for EUVL Development (October 1, 2008)
• International EUV Initiative (IEUVI) Overview: Challenges and Collaborative Efforts (July 1, 2006)
• EUVL: Status and Challenges Ahead (2003)
• Status of 193 nm technology (November 20, 2001)