Photon Sources for Lithography and Metrology (Editor)
SPIE Press 2023
Photon sources enable the extension of lithography and metrology technologies for continued scaling of circuit elements and therefore are the key drivers for the extension of Moore’s law. This comprehensive, 28-chapter volume is the authoritative reference on photon source technology and includes contributions from leading researchers and suppliers in the photon source field. It is intended to meet the needs of both practitioners of the technology and readers seeking a thorough introduction to EUV photon sources and their applications.
Topics include a state-of-the-art overview and in-depth explanation of photon source requirements, fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), a description of prominent DPP and LPP designs, and other technologies for producing EUV radiation at 13.5 nm. Additionally, this volume contains detailed descriptions of 193-nm excimer lasers, UV lamps, and laser-driven plasma sources for UV photons, all of which power many current lithography and metrology tools. CO2 lasers and 1-µm Nd-YAG lasers, used for pre-pulse in Sn LPP EUV sources, are also covered.
Alternative photon sources for 13.5-nm lithography and metrology, such as high-harmonic generation (HHG) and synchrotrons, along with their usage as a metrology tool, are discussed; and potential future photon sources such as free-electron lasers (FELs), solid-state 2-µm thulium lasers, and 1-µm Nd-YAG lasers are described. Additional topics include EUV source metrology, plasma diagnostics of EUV plasmas, grazing and normal incidence collector optics for plasma sources, debris mitigation, and mechanisms of component erosion in EUV sources.
EUV Lithography – 2nd Edition (Editor)
SPIE Press 2018
This book covers the fundamental aspects of extreme ultraviolet lithography (EUVL) of EUVL used in the field. Since 2008, when SPIE Press published the first edition of EUVL Lithography, much progress has been made to elevate EUVL as the top choice for next-generation lithography. This comprehensive volume is composed of contributions from the world’s leading EUVL researchers and provides the critical information needed by practitioners and those new to the field alike. This book is intended for both people who are involved within the field, as well as students.
EUV Lithography (Editor)
SPIE Press and John Wiley and Sons, 2009
Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists.
This comprehensive volume is comprised of contributions from the world’s leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field.
Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology.
EUV Sources for Lithography (Editor)
SPIE Press, 2006
Edited by a senior technical staff member at SEMATECH, this book serves as the authoritative reference book on EUV source technology. This volume contains 38 chapters contributed by leading researchers and suppliers, ranging from a variety of subjects from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources.
The book is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Extreme Ultraviolet Lithography (Editors: Vivek Bakshi and Anthony Yen)
SPIE Press, December 6, 2012
An SPIE Special Collection
Originally published in the Journal of Micro/Nanolithography, MEMS, and MOEMS and Proceedings of SPIE, this special collection of EUVL papers will ease the reader’s overwhelming task of sorting through volumes of technical papers to find informative and well-written work on specific topics of interest.
These selected papers were originally published in the Journal of Micro/Nanolithography, MEMS, and MOEMS and Proceedings of SPIE.