Nikon Research Corporation of America (NRCA) Joins Blue-X Consortium to Explore Leading-Edge Lithography at < 13. 5 nm.
The Blue-X consortium has recently welcomed six new members, including Nikon Research Corporation of America (NRCA), expanding its collaborative network to explore advanced optical projection lithography at wavelengths below 13.5 nm. EUV Litho, Inc. organizes this consortium as a Technical Working Group (TWG), which now comprises over 65 members who collectively have assigned more than 170 professionals to various sub-TWGs.
Among the distinguished members are major chip manufacturers such as IBM and Intel, along with a mix of large and small original equipment manufacturers (OEMs), National Labs, and independent experts from around the globe. This diverse group aims to push the boundaries of advanced lithography beyond 13.5 nm by harnessing collective expertise and fostering innovation across several specialized sub-TWGs. These sub-groups tackle critical areas, including Imaging and Optical Design, Optics, Mask, Metrology, Resist and Patterning and various Photon Source technologies.
The consortium also is engaging in initiatives such as Resist Evaluations at beamlines, ML optics development, optical design evaluations and Source Evaluations through programs like Flying Circus. These efforts underscore the Blue-X consortium’s dedication to advancing research and technology in the field. Detailed program information will be released soon.
The annual in-person meeting of the Blue-X TWG is scheduled for June 23rd at MIT LL. This event is exclusive to Blue-X TWG members, with a registration deadline of May 23rd. This meeting presents a unique opportunity to engage with leading experts and explore the next wave of technological innovations beyond EUV. Interested parties are encouraged to contact info@euvlitho.com for program updates, white papers, and membership information. The detailed agenda for the meeting, along with information for the 2025 EUVL and Source Workshop, has been announced on www.euvlitho.com.
Blue – X Sub TWGs Launched
We successfully organized an all sub -TWGs meeting on April 15, 2025. Previously we had a successful launch of nine Sub Technical Working Groups (sub TWGs) within the Blue-X Consortium from February 10-12, 2025! Led by industry experts, these groups will delve into various areas including Imaging, Resist, Mask, ML Optics, Sources and more, aiming to pave the way for advanced lithography below 13.5 nm. With the Consortium now boasting 57 members and approximately 150 assignees, including recent additions like Corning, PSI, Merck and TEL, the collaborative efforts are set to push the boundaries of technology. The meeting agenda, exclusively for members, can be accessed through the provided link. Let’s embark on this journey together as we delve into the next phase of technology advancement, driving the extension of Moore’s Law!
Previously: Blue -X Consortium Successfully Launched!
EUV Litho Inc. is pleased to announce Phase I of Blue-X, a consortium to investigate the potential of optical projection lithography in the wavelength region of 2–7 nm. The consortium was formally revealed during the 2024 Source Workshop in Amsterdam this October.
During Phase I, Blue-X is being organized as a technical working group (TWG), with sub- groups being formed in the areas of Source, Optics, Mask, Imaging and Resist. We currently have 37 organizations as members, including chip makers, original equipment manufacturers (OEMs), a university and national labs. These members have assigned approximately 110 professionals to participate in this TWG. We expect additional organizations to join and the number of TWG members to increase!
The first meeting of Blue-X TWG was held on Dec. 10 via Zoom. Meeting recording and presentations are available to Blue-X TWG members. Future periodic meetings will also be offered on Zoom, with an in-person gathering in June during the 2025 EUVL and Source Workshop at MIT LL.
If your organization is interested in finding out more about Blue-X, please contact us at info@euvlitho.com to request a copy of the White Paper. The process of joining the TWG is very simple and we will be happy to help you with it. The organizations, joining the TWG after December 10, 2024, will still have access to meeting proceedings and technical information produced by the TWG.