Final Agenda Announced!
2025 EUVL and Source Workshop and Blue-X TWG meeting Registrations Closes on Friday, May 23, 2025! Please contact us at info@euvlitho.com for additional information.
2025 EUVL and Source Workshop – Final Agenda
2025 EUVL and Source Workshop – Abstracts
2025 EUVL and Source Workshop – List of Accepted Papers
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The 2025 Extreme Ultraviolet Lithography (EUVL) and Source Workshop will be held at MIT Lincoln Laboratory, from June 21-26, 2025. This annual workshop, organized by EUV Litho, Inc., is a unique forum to discuss the challenge and progress of EUVL as it is being implemented in state-of-the-art semiconductor manufacturing. This workshop, co-organized with Lincoln Laboratory, will also focus on emerging new directions, which would enable semiconductor manufacturing to the end of this decade and well into the 2030s. In particular, leading researchers will present on hyper-NA lithography at 13.5 nm and on the various aspects of lithography at wavelengths below 13.5 nm (Blue-X), including sources, optics, optical design, photomasks, and photoresists. Please note that in 2025, annual EUVL and Source workshops are being held together in June 2025. June 21-22 will consist of online short courses, while June 23-26 will be an in-person workshop at Lincoln Laboratory.
- Poster Presentation Instructions
- Hotel and Transportation Information
- Registration and Sponsorship – 2025 EUVL and Source Workshop
- Workshop Registration for in-person workshop from June 23-26, 2025, will close on May 23, 2025!
- Registration for on-line short courses on June 21-22, 2025, will close on June 20, 2025.
- Registration and Course Description for Short Courses
- EUV and Soft X-Ray Sources
- EUV Lithography
- Accepted Papers (Keynote Presenters)
- Steven Carson (Intel)
- Robert Chau (NSTC)
- Allen Gabor (IBM)
- Mark Gouker (MIT LL)
- Debbie Gustafson (Energetiq)
- Bruce Smith (RIT)
- Oscar Versolato (ARCNL)
- Junji Yumoto (University of Tokyo)
- Accepted Papers (Invited Presenters)
- Please see List of Accepted Papers for a complete list
Nikon Research Corporation of America (NRCA) Joins Blue-X Consortium to Explore Leading-Edge Lithography at < 13. 5 nm
The Blue-X consortium has recently welcomed six new members, including Nikon Research Corporation of America (NRCA), expanding its collaborative network to explore advanced optical projection lithography at wavelengths below 13.5 nm. EUV Litho, Inc. organizes this consortium as a Technical Working Group (TWG), which now comprises over 65 members who collectively have assigned more than 170 professionals to various sub-TWGs.
Among the distinguished members are major chip manufacturers such as IBM and Intel, along with a mix of large and small original equipment manufacturers (OEMs), National Labs, and independent experts from around the globe. This diverse group aims to push the boundaries of advanced lithography beyond 13.5 nm by harnessing collective expertise and fostering innovation across several specialized sub-TWGs. These sub-groups tackle critical areas, including Imaging and Optical Design, Optics, Mask, Metrology, Resist and Patterning and various Photon Source technologies.
The consortium also is engaging in initiatives such as Resist Evaluations at beamlines, ML optics development, optical design evaluations and Source Evaluations through programs like Flying Circus. These efforts underscore the Blue-X consortium’s dedication to advancing research and technology in the field. Detailed program information will be released soon.
The annual in-person meeting of the Blue-X TWG is scheduled for June 23rd at MIT LL. This event is exclusive to Blue-X TWG members, with a registration deadline of May 23rd. This meeting presents a unique opportunity to engage with leading experts and explore the next wave of technological innovations beyond EUV. Interested parties are encouraged to contact info@euvlitho.com for program updates, white papers, and membership information. The detailed agenda for the meeting, along with information for the 2025 EUVL and Source Workshop, has been announced on www.euvlitho.com.
Please visit our Blue-X page for additional information on our previous meetings and announcements.
2024 Source Workshop Proceedings Published!
The 2024 Source Workshop was successfully held this year in Amsterdam, The Netherlands, with the support of ARCNL. The workshop proceedings are now available at the link below. Please contact us at info@euvlitho.com with any questions!
2024 EUVL Workshop and Supplier Showcase
2024 EUVL Workshop and Supplier Showcase was successfully held from June 2-6 at LBNL, Berkeley, CA. We are happy to announced the publication of the workshop proceedings!
- 2024 EUVL Workshop and Supplier Showcase Proceedings
- 2024 EUVL Workshop and Supplier Showcase Photographs
- 2024 EUVL Workshop and Supplier Showcase Final Agenda
- 2024 EUVL Workshop and Supplier Showcase Abstract Book
Keynote Speakers
Marcelo Ackermann, University of Twente
Steven Carson, Intel
In-Yong Kang, Samsung
Jan van Schoot, ASML
John Shalf, LBL
Steve Snyder, Micron
Takeo Watanabe, University of Hyogo
For List of Invited, Regular and Poster Papers, Please See the Final Agenda
We are happy to announce the publication of the proceedings for the 2023 Source Workshop held in Aachen, Germany from October 21-25, 2023. This year, we experienced our largest turnout and are looking forward to next year’s workshop to be held at ARCNL. We thank all who were involved in contributing to this year’s great success.
Purchase Proceedings
Our 16th annual EUVL Workshop and Supplier Showcase has now concluded.
PROCEEDINGS NOW PUBLISHED
For a full overview of the workshop, visit the 2023 EUVL Workshop and Supplier Showcase page.
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