Blue-X Consortium Launching with First Meeting on December 10, 2024!
EUV Litho Inc. is pleased to announce Phase I of Blue-X, a consortium to investigate the potential of optical projection lithography in the wavelength region of 2–7 nm. The consortium was formally revealed during the 2024 Source Workshop in Amsterdam this October.
During Phase I, Blue-X is being organized as a technical working group (TWG), with sub- groups being formed in the areas of Source, Optics, Mask, Imaging and Resist. We currently have 19 organizations as members, including chip makers, original equipment manufacturers (OEMs), a university and national labs. These members have assigned approximately 45 professionals to participate in this TWG. We expect additional organizations to join and the number of TWG members to increase.
The first meeting of Blue-X TWG will be held on Dec. 10 via Zoom. Future periodic meetings will also be offered on Zoom, with an in-person gathering in June during the 2025 EUVL and Source Workshop at MIT LL.
If your organization is interested in finding out more about Blue-X, please contact us at info@euvlitho.com to request a copy of our White Paper. There is still time for you to join the first launch meeting on Dec. 10.
2024 Source Workshop Proceedings Published!
The 2024 Source Workshop was successfully held this year in Amsterdam, The Netherlands, with the support of ARCNL. The workshop proceedings are now available at the link below. Please contact us at info@euvlitho.com with any questions!
2024 EUVL Workshop and Supplier Showcase
2024 EUVL Workshop and Supplier Showcase was successfully held from June 2-6 at LBNL, Berkeley, CA. We are happy to announced the publication of the workshop proceedings!
- 2024 EUVL Workshop and Supplier Showcase Proceedings
- 2024 EUVL Workshop and Supplier Showcase Photographs
- 2024 EUVL Workshop and Supplier Showcase Final Agenda
- 2024 EUVL Workshop and Supplier Showcase Abstract Book
Keynote Speakers
Marcelo Ackermann, University of Twente
Steven Carson, Intel
In-Yong Kang, Samsung
Jan van Schoot, ASML
John Shalf, LBL
Steve Snyder, Micron
Takeo Watanabe, University of Hyogo
For List of Invited, Regular and Poster Papers, Please See the Final Agenda
We are happy to announce the publication of the proceedings for the 2023 Source Workshop held in Aachen, Germany from October 21-25, 2023. This year, we experienced our largest turnout and are looking forward to next year’s workshop to be held at ARCNL. We thank all who were involved in contributing to this year’s great success.
Purchase Proceedings
Our 16th annual EUVL Workshop and Supplier Showcase has now concluded.
PROCEEDINGS NOW PUBLISHED
For a full overview of the workshop, visit the 2023 EUVL Workshop and Supplier Showcase page.