Home

Final Call for Papers

Abstract Submission Deadline: March 21, 2025

The 2025 Extreme Ultraviolet Lithography (EUVL) and Source Workshop will be held at MIT Lincoln Laboratory, from June 21-26, 2025. This annual workshop, organized by EUV Litho, Inc., is a unique forum to discuss the challenge and progress of EUVL as it is being implemented in state-of-the-art semiconductor manufacturing. This workshop, co-organized with Lincoln Laboratory, will also focus on emerging new directions, which would enable semiconductor manufacturing to the end of this decade and well into the 2030s. In particular, leading researchers will present on hyper-NA lithography at 13.5 nm and on the various aspects of lithography at wavelengths below 13.5 nm (Blue-X), including sources, optics, optical design, photomasks, and photoresists. Please note that in 2025, annual EUVL and Source workshops are being held together in June 2025. June 21-22 will consist of online short courses, while June 23-26 will be an in-person workshop at Lincoln Laboratory.

Final Call for Papers
- Abstract Submission Deadline: March 21, 2025
Abstract Template
Agenda Outline
Hotel and Transportation Information
Early Registration and Sponsorship – 2025 EUVL and Source Workshop
- Early Registration Discount Ends May 23, 2025!
Early Registration and Course Description for Short Courses (June 21-22, 2025) – Coming soon!
Accepted Papers (Keynote Presenters)
- Bob Atkins (MIT LL)
- Robert Chau (NSTC)
- Allen Gabor (IBM)
- Debbie Gustafson (Energetiq)
- Bruce Smith (RIT)
- Oscar Versolato (ARCNL)
- Additional Keynote talks to be announced soon!
Accepted Paper (Invited Presenters)
- Marcelo Ackermann ( Univ. of Twente)
- Andreas Biermanns – Foeth (Research Instruments)
- Marcus Benk (CXRO)
- Sascha Brose (RWTH)
- Jens Brunne (Trumpf)
- Franck Delmotte (Université Paris-Saclay)
- Anuja DeSilva (Lam)
- Congque Dinh (TEL)
- Torsten Feigl (optiXfab)
- Nishiki Fujimaki (Fuji Film)
- Igor Golovkin (Prism Computations)
- Takeshi Higashiguchi (Utsunomiya University)
- Hyun-Dam Jeong (Chonnam National University)
- Myung-Gil Kim (Sungkyunkwan University)
- Oleg Kostko (CXRO)
- Peter Kraus (ARCNL)
- Bruno LaFontaine (CXRO)
- Meng Lee (Veeco)
- Roni Levi (Corning)
- Dong Gun Lee (E-Sol)
- Jens Limpert (TRUMPF)
- Kevin Lucas (Synopsys)
- Hakaru Mizoguchi (Kyushu university)
- Peter Moulton (MIT LL)
- Chang-Yong Nam (Brookhaven National Lab)
- Michael Patra (Carl Zeiss)
- Brendan Reagan (LLNL)
- David Reisman (Energetiq)
- Robert Ridel (Class 5 Photonics)
- Alex Robinson (IM)
- Katrina Rook (Energetiq)
- Akira Sasaki (QST)
- Mark Shattenburg (MIT)
- John Sheil (ARCNL)
- Tsumoru Shintake (Okinawa University)
- Hank Smith (MIT)
- Victor Soltwisch (PTB)
- Yusuke Teramoto (Ushio)
- Michael Tsapatsis ( John Hopkins University)
- Kentaro Tomita (Hokkaido University)
- Jacqueline van Veldhoven (TNO)
- Additional Invited talks to be announced soon!

Blue – X Sub TWGs Launched

We are excited to announce the successful launch of nine Sub Technical Working Groups (sub TWGs) within the Blue-X Consortium from February 10-12, 2025! Led by industry experts, these groups will delve into various areas including Imaging, Resist, Mask, ML Optics, Sources and more, aiming to pave the way for advanced lithography below 13.5 nm. With the Consortium now boasting 53 members and approximately 145 assignees, including recent additions like Corning, PSI, and TEL, the collaborative efforts are set to push the boundaries of technology. The meeting agenda, exclusively for members, can be accessed through the provided link. Let’s embark on this journey together as we delve into the next phase of technology advancement, driving the extension of Moore’s Law!

Blue -X Consortium Successfully Launched!

Final Agenda – Blue-X Launch Meeting (December 10, 2024)

EUV Litho Inc. is pleased to announce Phase I of Blue-X, a consortium to investigate the potential of optical projection lithography in the wavelength region of 2–7 nm. The consortium was formally revealed during the 2024 Source Workshop in Amsterdam this October. During Phase I, Blue-X is being organized as a technical working group (TWG), with sub- groups being formed in the areas of Source, Optics, Mask, Imaging and Resist. We currently have 37 organizations as members, including chip makers, original equipment manufacturers (OEMs), a university and national labs. These members have assigned approximately 110 professionals to participate in this TWG. We expect additional organizations to join and the number of TWG members to increase! The first meeting of Blue-X TWG was held on Dec. 10 via Zoom. Meeting recording and presentations are available to Blue-X TWG members. Future periodic meetings will also be offered on Zoom, with an in-person gathering in June during the 2025 EUVL and Source Workshop at MIT LL. If your organization is interested in finding out more about Blue-X, please contact us at info@euvlitho.com to request a copy of the White Paper. The process of joining the TWG is very simple and we will be happy to help you with it. The organizations, joining the TWG after December 10, 2024, will still have access to meeting proceedings and technical information produced by the TWG.

2024 Source Workshop Proceedings Published!

The 2024 Source Workshop was successfully held this year in Amsterdam, The Netherlands, with the support of ARCNL. The workshop proceedings are now available at the link below. Please contact us at info@euvlitho.com with any questions!

2024 EUVL Workshop and Supplier Showcase

2024 EUVL Workshop and Supplier Showcase was successfully held from June 2-6 at LBNL, Berkeley, CA. We are happy to announced the publication of the workshop proceedings!

Keynote Speakers

Marcelo Ackermann, University of Twente

Steven Carson, Intel

In-Yong Kang, Samsung

Jan van Schoot, ASML

John Shalf, LBL

Steve Snyder, Micron

Takeo Watanabe, University of Hyogo

For List of Invited, Regular and Poster Papers, Please See the Final Agenda

We are happy to announce the publication of the proceedings for the 2023 Source Workshop held in Aachen, Germany from October 21-25, 2023. This year, we experienced our largest turnout and are looking forward to next year’s workshop to be held at ARCNL. We thank all who were involved in contributing to this year’s great success.