2017 EUVL Workshop – Final Agenda  announced!

Post Deadline Poster Paper Abstract Submission Deadline: May 23, 2017

Berkeley Guest House Rooms for 2017 EUVL workshop will be released on June 2, 2017. If you are not able to make a reservation for all days from the Guest House’s website, please contact the guest house directly by calling (510) 495-8000 or via email reservation@berkeleylabguesthouse.org to book the rooms.  We still have rooms available.

LBL,  location for EUVL Workshop, requires a “site access pass” for visiting the site including the Guest House. All EUVL Workshop registered attendees will be issued a site access pass before the workshop via email.

We are happy to announce the final agenda and abstract book for the 2017 EUVL Workshop, which can be downloaded at the links below.  All presenters have been sent acceptance letters. Please contact us if you have not received your acceptance letter. We are now only accepting abstracts for post-deadline poster papers. The deadline for post-deadline poster paper abstract submission is May 23, 2017.

The 2017 EUVL Workshop (2017 International Workshop on EUV Lithography) will be held June 12-15 at The Center for X-ray Optics (CXRO) at Lawrence Berkeley National Laboratory in Berkeley, CA. This workshop, now in its tenth year, is focused on the fundamental science of EUV Lithography (EUVL). Call for papers with instruction for submission of abstracts, travel and hotel information, on-line registration is available at the links below.