Executive Steering Committee
Seong-Sue Kim (Samsung)
Hiroo Kinoshita (Hyogo University)
Harry Levinson (HJL Lithography)
Kurt Ronse (IMEC)
Sam Sivakumar (Intel)
Tony Yen (ASML)
Technical Steering Committee
Reza Abhari (ETHZ)
Jinho Ahn (Hanyang University)
Gregory Denbeaux (University of Albany)
Padraig Dunne (University College Dublin)
Yasin Ekinci (PSI)
Torsten Feigl (optiX fab)
Igor Fomenkov (ASML)
Emily Gallagher (IMEC)
Gregg Gallatin (Applied Math Solutions)
Debbie Gustafson (Energetiq)
Larissa Juschkin (KLA)
Winfried Kaiser (Carl Zeiss)
Yanqiu Li (Beijing Institute of Technology)
Ted Liang (Intel)
Takahiro Kozawa (Osaka University)
Rainer Lebert (Research – Instruments)
Changmoon Lim (Hynix)
Sascha Migura (Carl Zeiss)
Hakaru Mizoguchi (Gigaphoton)
Patrick Naulleau (LBNL)
Hye-Keun Oh (Hanyang Univesity)
Ladislav Pina (Czech Technical University)
Abbas Rastegar (Applied Materials)
David Ruzic (University of Illinois at Urbana-Champaign)
Craig Siders (LLNL)
Regina Soufli (LLNL)
Kuen-Yu Tsai (National Taiwan University)
Britt Turkot (Intel)
Oscar Versolato (ARCNL)
Takeo Watanabe (Hyogo University)
Xiangzho Wang (Shanghai Institute of Optics and Fine Mechanics)
Jim Wiley (Wiley Strategic Solutions)
Organizing Chair
Vivek Bakshi (EUV Litho, Inc.)