EUVL Workshop Steering Committee

Executive Steering Committee

Seong-Sue Kim (Samsung)
Hiroo Kinoshita (Hyogo University)
Harry Levinson (GLOBALFOUNDRIES)
Kurt Ronse (IMEC)
Sam Sivakumar (Intel)
Takayuki Uchiyama (Toshiba)
Tony Yen (ASML)

Technical Steering Committee

Jinho Ahn (Hanyang University)
Vadim Banine (ASML)
Davide Bleiner (EMPA)
Reza Abhari (ETHZ)
Dan Corliss (IBM)
Gregory Denbeaux (University of Albany)
Padraig Dunne (University College Dublin)
Yasin Ekinci (PSI)
Akira Endo (Waseda University, Japan)
Masayuki Endo (Panasonic)
Torsten Feigl (optiX fab)
Igor Fomenkov (ASML)
Gregg Gallatin (Applied Math Solutions)
Mieke Goethals (IMEC)
Kenneth Goldberg (LBNL)
Steve Grantham (NIST)
Debbie Gustafson (Energetiq)
Ahmed Hassanein (Purdue University)
Clifford Henderson (Georgia Institute of Technology)
Winfried Kaiser (Carl Zeiss)
Jaehyun Kim (Dongjin Semichem)
John Kincade (Zygo)
Yanqiu Li (Beijing Institute of Technology)
Ted Liang (Intel)
Eric Louis (Univesity of Twente)
Takahiro Kozawa (Osaka University)
Rainer Lebert (Research – Instruments)
Changmoon Lim (Hynix)
Hakaru Mizoguchi (Gigaphoton)
Warren Montgomery (CNSE)
Patrick Naulleau (LBNL)
Hye-Keun Oh (Hanyang Univesity)
Sushil Padiyar (AMAT)
Ladislav Pina (Czech Technical University)
Yuriy Platonov (RIT)
David Pui (University of Minnesota)
Martin Richardson (University of Central Florida)
David Ruzic (University of Illinois at Urbana-Champaign)
Kuen-Yu Tsai (National Taiwan University)
Regina Soufli (LLNL)
Serge Tedesco (CEA)
Britt Turkot (Intel)
Oscar Versolato (ARCNL)
Takeo Watanabe (Hyogo University)
Xiangzho Wang (Shanghai Institute of Optics and Fine Mechanics)
Jim Wiley (ASML)
Sergey Zakharov (NAEXTSTREAM)

Organizing Chair

Vivek Bakshi (EUV Litho, Inc.)