EUV Source Workshop Technical Working Group (TWG)

Reza Abhari (ETH Zurich)
Peter Anastasi (Silson)
Sasa Bajt (DESY)
Vadim Banine (ASML)
Klaus Bergmann (ILT-Fraunhofer)
Davide Bleiner (University of Bern)
John Costello (DCU)
Udo Dinger (Zeiss)
Padraig Dunne (UCD)
Samir Ellwi (ISTEQ)
Akira Endo (HiLase)
Henryk Fiedorowicz (Military University of Technology, Poland)
Torsten Feigl (OptiXfab)
Igor Fomenkov (ASML)
Joost W. M. Frenken (ARCNL)
Debbie Gustafson (Energetiq)
Ahmed Hassanein (Purdue)
Takeshi Higashiguchi (Utsunomia University)
Stephen Horn (Energetiq)
Larissa Juschkin (Aachen University)
Chiew-seng Koay (IBM)
Konstantin Koshelev (ISAN)
Rainer Lebert (Research Instruments)
Peter Loosen (ILT-Fraunhofer)
Eric Louis (University of Twente)
James Lunney (Trinity College, Dublin)
John Madey (University of Hawaii)
Shunko Magoshi (EIDEC)
Hakaru Mizoguchi (Gigaphoton)
Katsuhiko Murakami (Nikon)
Patrick Naulleau (LBNL)
Fergal O’Reilly (UCD)
Gerry O’Sullivan (UCD)
Yuriy Platonov (RIT)
Ladislav Pina (Czech Technical University, Prague)
Jorge Rocca (University of Colorado)
David Ruzic (University of Illinois)
Akira Sasaki (JAEA)
Leonid Shmaenok (PhysTex)
Emma Sokell (UCD)
Atsushi Sunahara (Osaka University)
Yusuke Teramoto (BLV Licht)
Hironari Yamada (PPL)
Mikhail Yurkov (DESY)
Takayuki Uchiyama (Toshiba)
Oscar Versolato (ARCNL)
Obert Wood (GlobalFoundries)
Sergey Zakharov (Naextstream)
Wim van der Zande (ASML)

Vivek Bakshi (EUV Litho, Inc.) – Chair
Padraig Dunne (UCD) -Co-Chair