EUV Source Workshop Technical Working Group (TWG)

Reza Abhari (ETH Zurich)
Marcelo Ackerman (University of Twente)
Peter Anastasi (Silson)
Klaus Bergmann (ILT-Fraunhofer)
James Colgan (LANL)
Udo Dinger (Zeiss)
Padraig Dunne (UCD)
Samir Ellwi (ISTEQ)
Henryk Fiedorowicz (Military University of Technology, Poland)
Torsten Feigl (OptiXfab)
Igor Fomenkov
Debbie Gustafson (Energetiq)
Bjorn Manuel Hegelich (Tau Systems and UT Austin)
Takeshi Higashiguchi (Utsunomia University)
Larissa Juschkin (KLA- Tencor)
Hiroshi Kawata (KEK)
Konstantin Koshelev (ISTEQ)
Rainer Lebert (Research Instruments)
Thomas Metzer (Trumpf)
Hakaru Mizoguchi (Gigaphoton)
Fergal O’Reilly (UCD)
Gerry O’Sullivan (UCD)
Ladislav Pina (Rigaku and CTU)
Jorge Rocca (University of Colorado)
Akira Sasaki (JAEA)
Frank Scholze (PTB)
Craig Siders (LLNL)
Martin Smrz (HiLase)
Atsushi Sunahara (Purdue)
Yusuke Teramoto (BLV Licht)
Hironari Yamada (PPL)
Mikhail Yurkov (DESY)
Oscar Versolato (ARCNL)

Vivek Bakshi (EUV Litho, Inc.) – Chair