EUV Source Workshop Technical Working Group (TWG)

Reza Abhari (ETH Zurich)
Peter Anastasi (Silson)
Sasa Bajt (DESY)
Klaus Bergmann (ILT-Fraunhofer)
Udo Dinger (Zeiss)
Padraig Dunne (UCD)
Samir Ellwi (ISTEQ)
Akira Endo (HiLase)
Henryk Fiedorowicz (Military University of Technology, Poland)
Torsten Feigl (OptiXfab)
Igor Fomenkov (ASML)
Joost W. M. Frenken (ARCNL)
Debbie Gustafson (Energetiq)
Ahmed Hassanein (Purdue)
Takeshi Higashiguchi (Utsunomia University)
Stephen Horn (Energetiq)
Larissa Juschkin (RWTH Aachen University)
Konstantin Koshelev (ISAN)
Rainer Lebert (Research Instruments)
Peter Loosen (ILT-Fraunhofer)
Eric Louis (University of Twente)
Hakaru Mizoguchi (Gigaphoton)
Fergal O’Reilly (UCD)
Gerry O’Sullivan (UCD)
Yuriy Platonov (RIT)
Ladislav Pina (Czech Technical University, Prague)
Jorge Rocca (University of Colorado)
Akira Sasaki (JAEA)
Leonid Shmaenok (PhysTex)
Emma Sokell (UCD)
Atsushi Sunahara (Purdue)
Yusuke Teramoto (BLV Licht)
Hironari Yamada (PPL)
Mikhail Yurkov (DESY)
Takayuki Uchiyama (Toshiba)
Oscar Versolato (ARCNL)
Sergey Zakharov (Naextstream)
Wim van der Zande (ASML)

Vivek Bakshi (EUV Litho, Inc.) – Chair