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EUV Litho, Inc.

Promoting EUV Lithography via Workshops, Consulting & Education

2016 Source Workshop - Second Call for Papers

2016 EUVL Workshop

    2016 EUVL Workshop was successfully held from June 13-16, 2016. We expect to publish the workshop proceedings by July 15, 2016 on this website. Thank you for your participation and interest in the EUVL Workshop.

  • 2016 EUVL Workshop Keynote Speakers
  • Igor Foemnkov (ASML)
    Keynote presentation title: EUVL Exposure Tools for HVM - Status and Outlook

    Harry Levinson (GlobalFoundries)
    Keynote presentation title: EUV Lithography: Present and Future

    Britt Turkot (Intel)
    Keynote presentation title: EUVL Readiness for High Volume Manufacturing

  • 2016 EUVL Workshop Agenda (Updated)

  • 2016 EUVL Workshop Abstracts (Updated)

  • The 2016 International Workshop on EUV Lithography (2016 EUVL Workshop) is co-organized by EUV Litho, Inc. and The Center for X-ray Optics (CXRO) at Lawrence Berkeley National Laboratory, Berkeley, CA.

  • Download 2015 EUVL Workshop Proceedings

  • Download 2014 EUVL Workshop Proceedings

  • EUVL Workshop Home Page